JPH041512B2 - - Google Patents
Info
- Publication number
- JPH041512B2 JPH041512B2 JP57072422A JP7242282A JPH041512B2 JP H041512 B2 JPH041512 B2 JP H041512B2 JP 57072422 A JP57072422 A JP 57072422A JP 7242282 A JP7242282 A JP 7242282A JP H041512 B2 JPH041512 B2 JP H041512B2
- Authority
- JP
- Japan
- Prior art keywords
- fine movement
- members
- movement mechanism
- moving
- movable members
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000033001 locomotion Effects 0.000 claims description 39
- 230000007246 mechanism Effects 0.000 claims description 20
- 230000009471 action Effects 0.000 claims description 8
- 230000008602 contraction Effects 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 5
- 239000000470 constituent Substances 0.000 claims description 2
- 239000000696 magnetic material Substances 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- DMFGNRRURHSENX-UHFFFAOYSA-N beryllium copper Chemical compound [Be].[Cu] DMFGNRRURHSENX-UHFFFAOYSA-N 0.000 claims 1
- 239000010410 layer Substances 0.000 claims 1
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 claims 1
- 229910052451 lead zirconate titanate Inorganic materials 0.000 claims 1
- 239000002344 surface layer Substances 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 230000000694 effects Effects 0.000 description 5
- 239000002245 particle Substances 0.000 description 3
- 230000004044 response Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000013518 transcription Methods 0.000 description 2
- 230000035897 transcription Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Turning (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57072422A JPS58190079A (ja) | 1982-04-28 | 1982-04-28 | 微動機構 |
| US06/429,230 US4455501A (en) | 1982-02-09 | 1982-09-30 | Precision rotation mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57072422A JPS58190079A (ja) | 1982-04-28 | 1982-04-28 | 微動機構 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58190079A JPS58190079A (ja) | 1983-11-05 |
| JPH041512B2 true JPH041512B2 (en]) | 1992-01-13 |
Family
ID=13488829
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57072422A Granted JPS58190079A (ja) | 1982-02-09 | 1982-04-28 | 微動機構 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58190079A (en]) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH063788B2 (ja) * | 1983-12-30 | 1994-01-12 | 株式会社島津製作所 | 微動回転駆動装置 |
| JPS6182433A (ja) * | 1984-09-29 | 1986-04-26 | Toshiba Corp | 微動機構 |
-
1982
- 1982-04-28 JP JP57072422A patent/JPS58190079A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58190079A (ja) | 1983-11-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5089740A (en) | Displacement generating apparatus | |
| EP0166499B1 (en) | Precision moving mechanism | |
| JPS63299785A (ja) | 圧電・電歪素子を用いた衝撃力による微小移動装置 | |
| Sugihara et al. | Piezoelectrically driven XY θ table for submicron lithography systems | |
| JPH02262876A (ja) | 圧電回転装置 | |
| EP0085745B1 (en) | Fine rotation mechanism | |
| US7973450B2 (en) | Multi-degree-of micro-actuator | |
| JPH041512B2 (en]) | ||
| CN110661445B (zh) | 一种并联式三自由度压电谐振自致动机构及其激励方法 | |
| US8120231B2 (en) | Inertial drive actuator | |
| JP2004140946A (ja) | アクチュエータ | |
| JPH0358855B2 (en]) | ||
| JPS6044838B2 (ja) | 回転微動機構 | |
| JPH0527034Y2 (en]) | ||
| JPS63153405A (ja) | 走査型トンネル顕微鏡 | |
| JPH04222471A (ja) | 円筒アクチュエータ | |
| JP3173261B2 (ja) | 静電アクチュエータ | |
| JP3492221B2 (ja) | 微小移動装置 | |
| US3292020A (en) | Transducer | |
| JPH0151303B2 (en]) | ||
| JPS63220781A (ja) | 圧電アクチユエ−タおよびその駆動方法 | |
| JPS5983581A (ja) | 回転微動機構 | |
| JPS63161883A (ja) | 圧電形アクチユエ−タ | |
| JPH08182350A (ja) | 微小移動装置 | |
| JPS60219972A (ja) | 積層型圧電素子を利用した微動装置 |